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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.19 SNIP: 0.341 CiteScore™: 0.43

ISSN Imprimir: 1093-3611
ISSN On-line: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v6.i3.20
22 pages

THE ELECTRODEPOSITION OF CHROMIUM FROM MOLTEN ALKALI CHLORIDES. THE EFFECT OF THE DIRECT VOLTAMMETRY ON THE QUALITY OF AN INITIAL DEPOSIT OF METALLIC CHROMIUM

N. Bonciocat
Computer Aided Electrochemistry Laboratory (CAEL), « Politehnica » University Bucharest, 313 Splaiul hidependentei, 77206 Bucharest, Romania
A. Cotarta
Computer Aided Electrochemistry Laboratory (CAEL), « Politehnica » University Bucharest, 313 Splaiul hidependentei, 77206 Bucharest, Romania

RESUMO

An analysis of the electrodeposition process Cr2++2e®Cr0 taking place when a voltammetry with linear scanning of the potential is applied to an initial deposit of Cr0, previously obtained by a standard procedure, has been carried out supposing that the kinetic limitations come especially from the site of the solution. One shows that if the electrode reaction is reversible(i.e., the diffusion is rate limiting), the applying of a voltammetry with linear scanning of the potential improves the homogeneity of the initial deposit. Further, a modelling of the electrodeposition process by two parallel reactions has been made considering that to the first reaction participate the chromium ions that have difficulties in fulfilling the tunnelling condition, while to the second reaction those that have not such difficulties. This approach has led to two criteria for analysing the kinetic behaviour of two important types of electrodes : the redox electrodes inert metal | СrС13 / CrCl2, LiCl-KCl, respective the electrodes support |Cr0|CrCl2, LiCl-KCl. The first criterion permits to establish if the respective electrodes behave like unielectrodes and have homogeneous surfaces. The second criterion permits to estimate the degree of homogeneity of the initial deposit of Cr0.


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