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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN Imprimir: 1093-3611
ISSN On-line: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v9.i3.20
pages 345-352

FLOW AND TEMPERATURE DEPENDENCE OF PARTICLE FORMATION IN AR-SILANE RF CAPACITIVELY COUPLED PLASMAS

M. Sorokin
Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands
G. M. W. Kroesen
Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands
W. W. Stoffels
Eindhoven University of Technology, Department of Applied Physics, P.O.Box 513, DenDolech 2, Eindhoven, the Netherlands

RESUMO

In this work we present an overview of our investigations on the particle formation in Silane plasma. We propose a generalized model, based on a simple balance equation, explaining the temperature and flow dependence of the agglomeration time of nano-clusters in Ar-SiH4plasmas. This model allows easy incorporation of specific mechanisms and verification of their effect on particle growth.