Inscrição na biblioteca: Guest
Portal Digital Begell Biblioteca digital da Begell eBooks Diários Referências e Anais Coleções de pesquisa
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN Imprimir: 1093-3611
ISSN On-line: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v11.i4.100
pages 585-592

MODELING OF PULSED CAPILLARY DISCHARGE WAVEGUIDES USING A NON-LTE APPROACH

B. H. P. Broks
Department of Applied Physics, Eindhoven University of Technology, P. O. Box 513, 5600 MB Eindhoven, The Netherlands
Joost J. A. M. van der Mullen
Department of Applied Physics, Eindhoven University of Technology, P. O. Box 513, 5600 MB Eindhoven, The Netherlands

RESUMO

Pulsed capillary discharge waveguides are arc plasmas that have important applications as waveguides for laser-wakefield acceleration and high-harmonic generation. Both processes have important future biomedical applications. In this contribution, two key aspects of the modeling procedure are discussed: non-local thermal equilibrium (non-LTE) and wall heating. A comparison of the results of the non-LTE mode with a local thermal equilibrium model reveals that the latter model is inadequate for describing the formation mechanism of the waveguide in the discharge, but is adequate for describing the plasma once a waveguide has formed. The simulation of wall heating is useful for predicting wall ablation, but the effect of the hotter wall on the central plasma properties is modest, with a 5% difference in density observed.


Articles with similar content:

MOLECULAR DYNAMICS SIMULATION ON VAPOR SHIELDING UNDER HIGH HEAT LOAD
ICHMT DIGITAL LIBRARY ONLINE, Vol.3, 1997, issue
Saburo Toda, Y. Katsumura, H. Nakadate, Hidetoshi Hashizume
Thermal Therapy Approaches for Treatment of Brain Tumors in Animals and Humans
Critical Reviews™ in Biomedical Engineering, Vol.44, 2016, issue 6
Ann-Marie Broome, Anjan Motamarry, Dieter Haemmerich, Kris Helke, M. A. McCrackin, Chao Chen, A. L. Bredlau
PLASIMO: A MODELING TOOL FOR MULTICOMPONENT POLYATOMIC PLASMAS
Progress in Plasma Processing of Materials, 1999, Vol.1, 1999, issue
J. van Dijk, Joost J. A. M. van der Mullen, D. C. Schram, M. A. Tas, K.T.A.L. Burm, W. J. Goedheer, G. M. Janssen, D. A. Benoy
Computational Fluid Dynamic Analysis of Plasma Spray Physical Vapor Deposition
ICHMT DIGITAL LIBRARY ONLINE, Vol.0, 2017, issue
Robert Vaßen, Wenting He, Panpan Wang, Georg Mauer, Robert Mücke
Monte Carlo for Very Thin Layered Media
ICHMT DIGITAL LIBRARY ONLINE, Vol.14, 2007, issue
Sunil Kumar, Reginald Eze, Nabil Elkouh, Paul Sorenson, Roger Hill