Publicou 4 edições por ano
ISSN Imprimir: 1093-3611
ISSN On-line: 1940-4360
Indexed in
PLASMA EMISSION SYSTEMS FOR ELECTRON- AND ION-BEAM TECHNOLOGIES
RESUMO
Designs and basic characteristics of plasma sources of charged particles allowing one to realize a wide spectrum of electron- and ion-beam technologies are presented. Some applications of the developed structures of charged particles sources are considered. Sketches of promising designs of gas-discharge structures capable of forming combined electron and ion beams are proposed.
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Bogomolov Boris K., The Role of Chlorine Atoms in Etching Silicon in the Plasma of CF<inf>2</inf>Cl<inf>2</inf>/O<inf>2</inf>, 2018 XIV International Scientific-Technical Conference on Actual Problems of Electronics Instrument Engineering (APEIE), 2018. Crossref
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Antonovich D. A., Gruzdev V. A., Zalesski V. G., Soldatenko P. N., Plasma source of charged particles for the formation of combined ion-electron beams, Proceedings of the National Academy of Sciences of Belarus, Physical-Technical Series, 65, 3, 2020. Crossref
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Antonovich D A, Gruzdev V A, Experience of forming combined low-energy electron-ion beams in plasma sources of charged particles, IOP Conference Series: Materials Science and Engineering, 759, 1, 2020. Crossref