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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.19 SNIP: 0.341 CiteScore™: 0.43

ISSN Imprimir: 1093-3611
ISSN On-line: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Editor-in-Chief: Valiantsin M. Astashynski
Associate Editor: Nikolai N. Cherenda

Conselho editorial

Nikolay N. Koval
Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, 2/3 Akademichesky Ave., Tomsk, 634055, Russia; National Research Tomsk State University, 36 Lenin Ave., Tomsk, 634050, Russia

Oleg F. Petrov
Joint Institute of High Temperatures RAS, Russian Academy of Science, Moscow, Russia

Alexander Pogrebnjak
Department of Nanoelectronics, Sumy State University, 2 Rimsky-Korsakov Str., 40007 Sumy, Ukraine

Gennadii E. Remnev
National Research Tomsk Polytechnic University, 2a Lenin Ave., Tomsk, 634028, Russia

Vladimir V. Uglov
Belarusian State University, 4 Nezavisimost Ave., Minsk, 220030, Belarus; National Research Tomsk Polytechnic University, 2a Lenin Ave., Tomsk, 634028, Russia

Pawel Zhukowski
Lublin University of Technology, Poland