RT Journal Article ID 6a91c3210380f09f A1 Unno, Noriyuki A1 Asano, Motoharu A1 Matsuda, Yuki A1 Satake, Shin-ichi A1 Taniguchi, Jun T1 CHARACTERISTICS OF WATER EVAPORATION ON A NANOPATTERNED SURFACE FABRICATED BY UV NANOIMPRINT LITHOGRAPHY JF Heat Transfer Research JO HTR YR 2018 FD 2018-02-09 VO 49 IS 2 SP 145 OP 156 K1 evaporation K1 nanoimprint K1 UV curable resin K1 transparent K1 antireflection AB We investigated the behavior of water droplet evaporation on a nanopatterned surface. The nanopattern was fabricated by ultraviolet nanoimprint lithography (UV-NIL) on a transparent film using an UV curable resin. In this study, a moth-eye structure, which is used for anti-reflection, on a glassy carbon substrate was used as a master mold. Furthermore, a nanopattern made of the UV curable resin via UV-NIL was also used as a replica mold, and we succeeded in fabrication of a second generation nanopatterned film. Using both obtained transparent films with nanopattern, the evaporation characteristics of a water droplet were investigated. As a result, it became clear that the speed of evaporation on the first and second generation films was improved, compared to the substrate without the nanopattern. Moreover, the nanopatterned surface has a lower reflectance ratio than the planar surface. Consequently, the obtained film can be a multifunctional transparent film to prevent the light reflection and improve the evaporation rate of water droplet. PB Begell House LK https://www.dl.begellhouse.com/journals/46784ef93dddff27,2400214f1e3c5f59,6a91c3210380f09f.html