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Início - ICHMT DL Ano atual Arquivos Comitê executivo Centro Internacional para Transferência de Calor e Massa

SEQUENTIAL NANO-PATTERNING USING ELECTRON AND LASER BEAMS: A NUMERICAL METHODOLOGY

DOI: 10.1615/ICHMT.2004.RAD-4.310
12 pages

Basil T. Wong
Faculty of Engineering, Computing & Science Swinburne University of Technology Sarawak Campus Kuching, Sarawak 93350, Malaysia

M. Pinar Menguc
Center for Energy, Environment and Economy (CEEE), Department of Mechanical Engineering, Ozyegin University, Cekmekoy, 34794, Istanbul Turkey; and University of Kentucky, Radiative Transfer Laboratory, Lexington, KY 40506, USA

R. Ryan Vallance
Mechanical and Aerospace Engineering, The George Washington University, 738 Academic Center, 801 22nd St., N.W., Washington, DC 20052

Resumo

A methodology is presented for nanometer-size patterning of a workpiece using both an electron-beam and a laser. A Monte Carlo/Ray Tracing technique is used in modeling the electron-beam propagation inside a thin gold film. This approach is identical to that of a typical Monte Carlo simulation in radiative transfer except that proper electron scattering properties are employed. The laser propagation within the one-dimensional, non-scattering film on top of a quartz substrate is modeled using a ray-tracing approach and reflections at the boundaries are accounted for with the Fresnel-expressions. The temperature distribution inside a gold film is then predicted using the Fourier law of heat conduction, after evaluating the accuracy of the model for the range considered. A sequential nano-pattern is created using these coupled numerical simulations.

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