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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Печать: 1093-3611
ISSN Онлайн: 1940-4360

Выпуски:
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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.2016019375
pages 241-250

CHARACTERIZATION AND EVALUATION OF THE MECHANICAL PROPERTIES OF A SPUTTERED Ti THIN FILM ON AA6061 SUBSTRATE

S. Venkatesan
Mechanical Engineering, Dr N.G.P. Institute of Technology, Coimbatore, Tamilnadu, India
M. Ramu
Department of Mechanical Engineering, Amrita School of Engineering, Amrita Vishwa Vidyapeetham, Amrita University, Coimbatore, Tamil nadu, India
M. Yuvaraja
Department of Mechanical Engineering, PSG College of Technology, Coimbatore, Tamil nadu, India

Краткое описание

This paper reports characterization and evaluation of the mechanical properties of a titanium (Ti) film deposited on AA6061 substrate using the DC magnetron sputtering technique. The surface morphology of the Ti film was determined using scanning electron microscopy (SEM). The presence of metallic Ti was confirmed by energy-dispersive x-ray (EDX) analysis. An increase in the Ti thin film thickness from 15 μm to 26 μm on the substrate exhibits significant improvement in hardness, scratch resistance, superior adhesion, and excellent surface roughness.

Ключевые слова: titanium, thin films, sputtering, hardness

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