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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN Печать: 1093-3611
ISSN Онлайн: 1940-4360

Выпуски:
Том 24, 2020 Том 23, 2019 Том 22, 2018 Том 21, 2017 Том 20, 2016 Том 19, 2015 Том 18, 2014 Том 17, 2013 Том 16, 2012 Том 15, 2011 Том 14, 2010 Том 13, 2009 Том 12, 2008 Том 11, 2007 Том 10, 2006 Том 9, 2005 Том 8, 2004 Том 7, 2003 Том 6, 2002 Том 5, 2001 Том 4, 2000 Том 3, 1999 Том 2, 1998 Том 1, 1997

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v3.i1.40
pages 39-50

ABOUT ROTATIONAL TEMPERATURE MEASUREMENTS AND THERMODYNAMIC EQUILIBRIUM IN RF GLOW DISCHARGES

Spyros Stamou
Plasma Chemistry Department of Chemical Engineering, University of Patras P.O.Box 1407, 26500, Patras, Greece
Dimitris Mataras
Plasma Technology Laboratory -Dept. of Chem. Engineering-University of Patras, P.O.Box 1407, 26500 Patra, Greece
Dimitrious E. Rapakoulias
Plasma Technology Lab, Dept. Chem. Engineering, University of Patras, P.O.Box 1407, 26500 Patra, Greece

Краткое описание

The rotational temperature of the А2Δ excited state of SiH has been determined in a silane r.f. glow-discharge by optical emission spectroscopy, using both a revised Boltzman diagram method and a detailed simulation of the emission spectrum utilising a least squares fitting (LSF) method. It is shown here that the LSF is more reliable and a careful use can lead to accurate results. This is accomplished by using an improved term value formula and an optimisation of the set of constants are used to calculate the best possible simulation of the spectrum. On the other hand, important informations about the achievement of thermodynamic equilibrium are obtained, with the use of the Boltzman plot method. It is shown that the population distribution in the rotational levels of a short-lived electronic state is well described by Boltzman statistics. In both methods, the experimentally determined FWHM of the optical system is of major importance.