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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Печать: 1093-3611
ISSN Онлайн: 1940-4360

Выпуски:
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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v5.i2.70
8 pages

MODEL FOR ELECTRONIC RELAXATION IN PLASMA JETS FOR MIXTURES AR-O2

A. Lebehot
Laboratoire d'Aerothermique du CNRS 1C Avenue de la Recherche Scientifique, 45071 Orleans Cedex 2, France
V. Lago
Laboratoire d'Aerothermique du CNRS 1C Avenue de la Recherche Scientifique, 45071 Orleans Cedex 2, France
Michel A. Dudeck
ICARE Inst.-CNRS and University of Paris 6, 75252 Paris, France
J. Kurzyna
Instytut Podstawowych Problemow Techniki - PAN, Swietokrzyska 21,00-149 Warszawa, Polska

Краткое описание

A simple collisional-radiative model is applied to plasma jet expansions in the case of Ar-O2 mixtures in order to calculate the population densities of the electronic states of the neutral atomic species Ar and O. Are included in the calculation: the direct excitation and de-excitation of Ar and O by electron collisions, excitation transfers between heavy species (Ar-Ar, Ar-O, Аr-О2, O-O2 and O-O collisions), and spontaneous radiative decay of Ar and O atoms. The results are compared with the experimental data obtained by three different experiments.


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