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ISSN Печать: 1093-3611
ISSN Онлайн: 1940-4360
Indexed in
INFLUENCE OF NEGATIVE SUBSTRATE BIAS ON PLASMA PROPERTIES AND SILICON FILM DEPOSITION RATE
Краткое описание
The role of substrate bias on the properties of the discharge and on silicon film deposition was investigated. In order to isolate the bias effect on the deposition procedure the experiments were carried out under conditions of constant power dissipation and pressure. The applied negative bias voltage induces changes on the electrical characteristics (voltage, current, impedance) of the discharge affecting the electron density and consequently radical production rate. Furthermore, the applied substrate bias causes a decrease on the deposition rate, which could be attributed mainly to the modification of the product species density by the change of plasma -sustaining mechanism.
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Wang Gui-Gen, Kuang Xu-Ping, Zhang Hua-Yu, Zhu Can, Han Jie-Cai, Zuo Hong-Bo, Ma Hong-Tao, Silicon nitride gradient film as the underlayer of ultra-thin tetrahedral amorphous carbon overcoat for magnetic recording slider, Materials Chemistry and Physics, 131, 1-2, 2011. Crossref