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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

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ISSN Печать: 1093-3611

ISSN Онлайн: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

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INFLUENCE OF NEGATIVE SUBSTRATE BIAS ON PLASMA PROPERTIES AND SILICON FILM DEPOSITION RATE

Том 11, Выпуск 3, 2007, pp. 467-475
DOI: 10.1615/HighTempMatProc.v11.i3.130
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The role of substrate bias on the properties of the discharge and on silicon film deposition was investigated. In order to isolate the bias effect on the deposition procedure the experiments were carried out under conditions of constant power dissipation and pressure. The applied negative bias voltage induces changes on the electrical characteristics (voltage, current, impedance) of the discharge affecting the electron density and consequently radical production rate. Furthermore, the applied substrate bias causes a decrease on the deposition rate, which could be attributed mainly to the modification of the product species density by the change of plasma -sustaining mechanism.

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  1. Wang Gui-Gen, Kuang Xu-Ping, Zhang Hua-Yu, Zhu Can, Han Jie-Cai, Zuo Hong-Bo, Ma Hong-Tao, Silicon nitride gradient film as the underlayer of ultra-thin tetrahedral amorphous carbon overcoat for magnetic recording slider, Materials Chemistry and Physics, 131, 1-2, 2011. Crossref

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