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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Печать: 1093-3611
ISSN Онлайн: 1940-4360

Выпуски:
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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v13.i1.30
pages 45-59

INFLUENCE OF THE SELF-ABSORPTION OF ATOMIC LINES ON THE DETERMINATION OF TEMPERATURE AND ELECTRON NUMBER DENSITY IN THE CASE OF A LASER INDUCED CaCl2 − WATER PLASMA

Riadh Hannachi
Laboratoire de Spectroscopie Atomique Moléculaire et Applications, Université de Tunis El Manar, Tunis 1060, Tunisia; Laboratoire Plasma et Conversion d'Energie, UMR INP-UPS-CNRS 5213, Université Paul Sabatier, Toulouse 3, France
Philippe Teulet
CPAT, Universite Paul Sabatier, 118, Rte de Narbonne, 31062 Toulouse Cx 4, France
Guy Taieb
Laboratoire de Photophysique Moléculaire du CNRS, Université Paris XI, Bâtiment 210, 91405 Orsay, France
Y. Cressault
Centre de Physique des Plasmas et de leurs Applications de Toulouse (CPAT) UMR n° 5002 − Université Paul Sabatier, 118 Route de Narbonne F31062 Toulouse Cedex 4 - France
Alain Gleizes
Centre de Physique des Plasmas et de leurs Applications de Toulouse (CPAT) UMR n° 5002 − Université Paul Sabatier, 118 Route de Narbonne F31062 Toulouse Cedex 4 - France
Zohra Ben Lakhdar
Laboratoire de Spectroscopie Atomique Moléculaire et Applications, Université de Tunis El Manar, Tunis 1060, Tunisia

Краткое описание

A spectroscopic study of the plasma plume created by a laser beam on the surface of a CaCl2 aqueous solution is presented. Optical emission spectra are recorded and temporally analyzed. The electron number density is determined from the Stark broadening of the nitrogen NI 746.8 nm atomic line and the temperature profile is obtained from the relative intensity of OI lines. To take into account the possible occurrence of the self-absorption phenomenon, the escape factor of each atomic line is computed and used to correct the measured line intensities in order to obtain reliable temperature and density profiles.


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