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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Печать: 1093-3611
ISSN Онлайн: 1940-4360

Выпуски:
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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v1.i4.40
pages 449-460

CONTINUOUS MONITORING OF METAL VOLATILISATION IN A PLASMA FURNACE BY INDUCTIVELY COUPLED PLASMA EMISSION SPECTROMETRY

C. Trassy
UPR 9033 CNRS - EPM, ENSHMG BP 95 - 38402 Saint-Martin-d'Heres - France
F. Petit
UPRES A 6015 CNRS - L.M.C.T.S. - Equipe "Plasma, Laser, Materiaux" 123, avenue Albert Thomas - 87060 Limoges Cedex - France
R. Diemiaszonek
LPCI - Bat. 401 - INSA - 69621 Villeurbanne - France
Pierre Fauchais
Laboratoire Sciences des Procedes Ceramiques et de Traitements de Surface UMR CNRS 6638 University of Limoges 123 avenue Albert Thomas, 87060 LIMOGES - France

Краткое описание

Several recent studies have shown that it is possible to use Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES) in the online analysis of metals in flue gases produced by industrial processes. The limits of detection observed are very low, in the μg/m3 range. This technique has been used to monitor the gases in a plasma reactor devoted to treatment of fine dusts. It permitted us to follow the variations of metal concentrations in the gaseous phase and to evaluate the evaporation rate of various elements according to the reactor parameters. The response time of this technique is very fast, less than one minute in fact. The main difficulty is due to the changes in gas composition. These changes induce a variation in the method sensitivity. It results in errors in the measurement of the absolute concentrations. Solutions are proposed to overcome this difficulty. In spite of these disadvantages, such a method could be very useful in process control.


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