RT Journal Article ID 4218028f2535ad11 A1 Antonovich, D. A1 Gruzdev, V. A1 Zalesski, V. A1 Pobol, Igor A1 Soldatenko, Pavel T1 PLASMA EMISSION SYSTEMS FOR ELECTRON- AND ION-BEAM TECHNOLOGIES JF High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes JO HTM YR 2017 FD 2018-01-31 VO 21 IS 2 SP 143 OP 159 K1 plasma electron source K1 low-energy beams K1 combined ion and electron beams K1 electron-beams technologies AB Designs and basic characteristics of plasma sources of charged particles allowing one to realize a wide spectrum of electron- and ion-beam technologies are presented. Some applications of the developed structures of charged particles sources are considered. Sketches of promising designs of gas-discharge structures capable of forming combined electron and ion beams are proposed. PB Begell House LK https://www.dl.begellhouse.com/journals/57d172397126f956,77c7b2b35327a7a9,4218028f2535ad11.html