%0 Journal Article %A Anisimova, I.A. %A Anisimov, V.P. %A Makarov , V.P. %A Otorbaev, D.K. %D 1998 %I Begell House %K hydrocarbon films, plasma deposition %N 1 %P 143-154 %R 10.1615/HighTempMatProc.v2.i1.110 %T STRUCTURE AND PROPERTIES OF CARBON AND HYDROCARBON FILMS DEPOSITED IN PLASMA OF LOW-PRESSURE ARC AND UNBALANCED DC MAGNETRON %U https://www.dl.begellhouse.com/journals/57d172397126f956,294facf4270aef6e,5de69f2226b95647.html %V 2 %X Amorphous hydrogenated carbon films were deposited in the plasma of a low-pressure arc discharge burning at the evaporating graphite electrode and in the plasma of a unbalanced magnetron sputtering discharge in different gas environments (Ar, CH4). The film structure was investigated by micro-diffraction method of transmission electron microscopy. Influence of the deposition technique and of the gas composition on the structure and on optical and electrical properties of the deposited films have been investigated. %8 1998-04-30