LOW TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON FILMS ON DIFFERENT SUBSTRATES

A. Ya. Vinogradov; A. N. Andronov; A. B Ustinov; K. E. Orlov; A. S. Smirnov

doi:10.1615/HighTempMatProc.v10.i3.90

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Chefredakteurs: Valiantsin M. Astashynski (open in a new tab) Andrey V. Gusarov (open in a new tab)

Mitherausgeber: Nikolai N. Cherenda (open in a new tab)

Erscheint 4 Ausgaben pro Jahr

ISSN Druckformat: 1093-3611

ISSN Online: 1940-4360

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LOW TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON FILMS ON DIFFERENT SUBSTRATES

Volumen 10, Ausgabe 3, 2006, pp. 457-466

DOI: 10.1615/HighTempMatProc.v10.i3.90

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A. Ya. Vinogradov
A.F. Ioffe Physical-Technical Institute RAS, Polytechnicheskaya 26, 194021, St.-Petersburg, Russia

A. N. Andronov
St.-Petersburg State Polytechnical University, Polytechnicheskaya 29, 195251, St-Petersburg, Russia

A. B Ustinov
St.-Petersburg State Polytechnical University, Polytechnicheskaya 29, 195251, St-Petersburg, Russia

K. E. Orlov
St.-Petersburg State Polytechnical University, Polytechnicheskaya 29, 195251, St-Petersburg, Russia

A. S. Smirnov
St.-Petersburg State Polytechnical University, Polytechnicheskaya 29, 195251, St-Petersburg, Russia

ABSTRAKT

Polymer and diamond like carbon thin films were deposited at temperature below 250°C by high frequency (40−60 MHz) plasma enhanced chemical vapor deposition. The films have been successfully deposited on metal (Ti, Cu, Mo, Ta, Ni, Pt), silicon, germanium, ceramic, quarts and glass flat substrates as well as on 3-D objects: metal balls, washer, tips, cones. Electron field emission, optical and electrical properties, mechanical and tribological behavior of the films were studied in comparison with their structure, phase and chemical composition. Plasma pre-treatment of the substrate, ion bombardment and etching of growing film surface were found to be the key factors of the film deposition process.

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