High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
Erscheint 4 Ausgaben pro Jahr
ISSN Druckformat: 1093-3611
ISSN Online: 1940-4360
IF:
0.4
Immediacy Index:
0.1
Eigenfactor:
0.00005
JCI:
0.07
SJR:
0.198
SNIP:
0.48
CiteScore™::
1.1
H-Index:
20
Indexed in
RADIO FREQUENCY DISCHARGE PLASMA AND HELICON SOURCE FOR DIFFERENT APPLICATIONS
Volumen 18,
Ausgabe 1-2, 2014,
pp. 111-117
DOI: 10.1615/HighTempMatProc.2015015432
ABSTRAKT
The steady-state helicon discharge allows for formation and acceleration of compact plasmoids. The helicon source and its applications (electrodeless plasma thrusters, plasma accelerators and injectors, plasma etching and spraying, plasma treatment of materials and medicine, etc.) are being investigated. The design and operating principle are demonstrated on the basis of a typical scheme of the installation. The main aim of this work is to create an approximate mathematical model of a plasma source of helicon type (coaxial pulsed plasma thruster).
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