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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

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ISSN Druckformat: 1093-3611

ISSN Online: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

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SYNTHESIS AND PROPERTIES OF FULLERENE CONTAINED FILMS IN RF PLASMA

Volumen 9, Ausgabe 2, 2005, pp. 263-267
DOI: 10.1615/HighTempMatProc.v9.i2.80
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ABSTRAKT

The process of deposition of semitransparent fullerene contained composite films in a capacitively coupled rf discharge is investigated. The 5.28 MHz discharge is operated in a parallel plate reactor. As a working gas helium is used at pressure 0.5 ÷ 5 Torr. Carbon films are deposited on a quartz plate. Products of electric arc synthesis of fullerenes (a small-dispersed carbon soot containing fullerene C60 and C70) are used as an initial substance for making carbon films. The processes in the discharge are studied by emission spectroscopy methods. The gas kinetic temperature is measured in different zones of the discharge gap near the quartz substrate. Optical absorption properties and structure of obtained films are investigated using UV-VIS spectrophotometer and scanning electron microscope.

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