Publicado 4 números por año
ISSN Imprimir: 1093-3611
ISSN En Línea: 1940-4360
Indexed in
OPTICAL SPECTROSCOPIC DIAGNOSTIC OF AN Ar+H2 RF THERMAL PLASMA USED TO THE SILICON POWDER PURIFICATION. EFFECT OF THE EVAPORATION PHENOMENA
SINOPSIS
Ar+H2 RF thermal plasma spraying is used to melt, purify and hydrogenate metallurgical silicon particles in order to elaborate a thin layer for photovoltaics applications. Hydrogenation and purification phenomena have been analysed by a spectroscopic diagnostic. Transitions of excited argon, hydrogen and silicon detected have been used to calculate the electronic density, electronic temperature and silicon vapor content in the plasma flow.
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Jaworek Anatol, Sobczyk Arkadiusz, Czech Tadeusz, Krupa Andrzej, Corona discharge in electrospraying, Journal of Electrostatics, 72, 2, 2014. Crossref