Publication de 4 numéros par an
ISSN Imprimer: 2151-4798
ISSN En ligne: 2151-562X
Indexed in
SIMULATION OF CHEMICAL VAPOR DEPOSITION: FOUR-PHASE MODEL
RÉSUMÉ
We are motivated to model plasma-enhanced chemical vapor deposition processes for metallic bipolar plates and their optimization for depositing a homogeneous layer on the metallic plate. Moreover, constraints to the deposition process are very low pressure (nearly a vacuum) and low temperature (about 400 K). This paper derives a computable multi-physics model of a single computable physical problem based on a porous media model. While the micro- and macro-scales are related to adsorption, diffusion, and advection processes, we present a homogenized porous media model that embeds the microscopic scales into the macroscopic scales. We deal with some assumptions to simplify the complicated process so that we can derive a computable mathematical model without neglecting real-life processes. To model the gaseous transport in the apparatus as a porous media model, we derive a multi-phase model based on mobile, immobile, and adsorbed gaseous phases in a chamber that is filled with the plasma medium. The verification of such a complicated model is done with real-life experiments for single species. Numerical simulations help to replace expensive physical experiments and obtain control mechanisms for the delicate deposition process. Numerical methods are discussed to solve such multi-scale and multi-phase models and to obtain qualitative results for the delicate multi-physical processes in the chamber. We discuss a splitting analysis to couple such multi-physical problems. Numerical benchmark problems based on the multi-phase model are presented. Real-life approaches to physical experiments are verified by numerical experiments.
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Geiser Jürgen, Multiscale modelling and splitting approaches for fluids composed of Coulomb-interacting particles, Mathematical and Computer Modelling of Dynamical Systems, 24, 4, 2018. Crossref