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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

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ISSN Печать: 1093-3611

ISSN Онлайн: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

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MULTIBIT STRUCTURE FOR THE FORMATION OF COMBINED OR ALTERNATING ELECTRON-ION BEAMS

Том 24, Выпуск 2, 2020, pp. 147-156
DOI: 10.1615/HighTempMatProc.2020033966
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Краткое описание

Currently, sources of ion and electron beams make it possible to implement a wide range of effective technologies for processing materials and surface modifications. In some cases, a significant increase in the effectiveness of such technologies is achieved with simultaneous exposure to electron and ion beams through the use of two types of separate (electron and ion) sources. At the same time, experience in the development and use of plasma sources of charged particles shows the possibility of creating a combined electron-ion flow in one direction and in a single discharge system. In this work, we propose an experimental electrode structure of a plasma electron-ion source for the formation of a combined electron-ion or separate electron and ion beams. A number of its characteristics and the prospects for further development of an electron-ion source for industrial use on its basis are shown.

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