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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

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ISSN Печать: 1093-3611

ISSN Онлайн: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

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RESIDUAL STRESS IN PVD COATINGS - RELATIONSHIP BETWEEN STRESS AND TEXTURE

Том 2, Выпуск 3, 1998, pp. 391-399
DOI: 10.1615/HighTempMatProc.v2.i3.80
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Краткое описание

The main purpose of this work is the study of the relationship between the stress and the texture of films of chromium and chromium nitride deposited by different PVD techniques (Vacuum Evaporation, Ion Plating, Vacuum Arc Evaporation).
The effect of two deposition parameters, the substrate temperature and the substrate bias voltage has been investigated. The residual stress has been measured by the analysis of the stress induced sample bending [1].

Ключевые слова: texture, residual stress, chromium, chromium nitride, coatings
ЦИТИРОВАНО В
  1. Gautier C., Moulard G., Chatelon J.P., Motyl G., Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films, Thin Solid Films, 384, 1, 2001. Crossref

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