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ISSN Печать: 1093-3611
ISSN Онлайн: 1940-4360
Indexed in
RESIDUAL STRESS IN PVD COATINGS - RELATIONSHIP BETWEEN STRESS AND TEXTURE
Краткое описание
The main purpose of this work is the study of the relationship between the stress and the texture of films of chromium and chromium nitride deposited by different PVD techniques (Vacuum Evaporation, Ion Plating, Vacuum Arc Evaporation).
The effect of two deposition parameters, the substrate temperature and the substrate bias voltage has been investigated. The residual stress has been measured by the analysis of the stress induced sample bending [1].
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Gautier C., Moulard G., Chatelon J.P., Motyl G., Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films, Thin Solid Films, 384, 1, 2001. Crossref