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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

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ISSN Печать: 1093-3611

ISSN Онлайн: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

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STUDY OF PULSED AND CONTINUOUS MODES OF MICROWAVE DISCHARGE PLASMA GENERATION IN A RESONATOR-TYPE PLASMATRON

Том 25, Выпуск 2, 2021, pp. 65-75
DOI: 10.1615/HighTempMatProc.2021039440
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Краткое описание

This article presents the effects of the medium-power microwave magnetron power supply method on the modes of microwave discharge plasma generation. The measured current signals in the anode circuit of the microwave magnetron, signals of integral optical plasma luminescence, and the registered optical emission spectrum of the discharge were studied using single-phase and three-phase power sources. The power input into the microwave discharge was estimated from the area under the envelope of the integral optical plasma luminescence signal. When the microwave magnetron is supplied by a three-phase power source, a transition to a continuous generation mode is performed. For a three-phase power source, the transition from the minimum power consumption mode (1800 W) to the mode with the maximum level of power consumption (4020 W) leads to an increase in the signal area under study at a time interval of 0.02 s by about 4 times. The diagnostics of the plasma by optical emission spectroscopy showed that changing the power supply mode of the microwave magnetron and the amount of microwave power fed to the discharge in O2 can provide an increase in the intensity of OI lines by more than 6 times. This indicates an augmentation in the concentration of excited particles, which can be involved in various plasma-chemical processes. We conclude that the considered schematic solution of the microwave magnetron power source, which ensures the continuous formation of the microwave discharge, is promising for solving the problems of developing effective microwave vacuum-plasma processes and equipment.

ЛИТЕРАТУРА
  1. Bordusau, S.V., Microwave Plasma Technologies in The Production of Electronic Devices, Minsk: Best-print, p. 452, 2002.

  2. Bordusau, S.V., Madveika, S.I., and Dostanko, A.P., Device for Regulating the Instantaneous Power Value of the Microwave Magnetron Operating on a Plasma Load, BY Patent 6517, filed Oct. 13, 2009, and issued Aug. 30, 2010.

  3. Madveika, S.I. and Bordusau, S.V., Schematic Peculiarities of Power Supply Magnetron Continuous Regime of Generation for Work in Composed of Technological Plasma Equipment, Doklady BGUIR, vol. 6, no. 52, pp. 30-34, 2010.

  4. Masruroh, Santjojo, D.J.D.H., Abdurrouf, Abdillah, M.A., Padaga, M.C., and Sakti, S.P., Effect of Electron Density and Temperature in Oxygen Plasma Treatment of Polystyrene Surface, IOP Conf. Ser.: Mater. Sci. Eng., vol. 515, 012061, 2019. DOI: 10.1088/1757-899X/515/1/012061.

  5. Moore, C.E., Selected Tables of Atomic Spectra: A. Atomic Energy Levels-Second Edition; B. Multiplet Tables; O I, accessed Feb. 20, 2021, from https://physics.nist.gov/PhysRefData/Handbook/Tables/ oxygentable2.htm, 1976.

  6. Musil, J., Matous, J., and Rajsky, A., Optical Emission Spectra from Microwave Oxygen Plasma Produced by Surfatron Discharge, Czech. J.Physics, vol. 43, pp. 533-540, 1993.

  7. Namitokov, K.K., Pahomov, P.L. and Harm, S.N., Emission of Gas-Discharge Plasma, Almaty: Nauka, p. 302, 1984.

  8. Pueschner, H., Heating with Microwaves: Fundamentals, Components and Circuit Technique, Eindhoven: Philips Technical Library, p. 320, 1966.

  9. Tihonov, V.N., Pugashkin, D.V., and Chetokin, Ya.A., Microwave Generator, RU Patent 2480890, filed Dec. 09, 2011, and issued Apr. 27, 2013.

  10. Yafarov, R.K., Physics ofMicrowave Vacuum-Plasma Nanotechnology, Moscow: Fizmatlit, p. 216, 2009.

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